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Resistive Hose Instability for Arbitrary Skin Depth


Resistive hose growth for moderate or large skin-depth differs from that derived from a conductivity model. Asymptotic growth is calculated for the Bennett equilibrium, incorporating the inductive component in the plasma return current, with phase-mixing accounted for via the "distributed-mass" model. Analytic scalings are checked with numerical solutions of the linearized model. For a ratio of skin-depth to beam radius less than 1/10 the conductivity model appears quite adequate. When this ratio exceeds 1/4 inductive corrections appear.

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